JPH0425229U - - Google Patents

Info

Publication number
JPH0425229U
JPH0425229U JP6557790U JP6557790U JPH0425229U JP H0425229 U JPH0425229 U JP H0425229U JP 6557790 U JP6557790 U JP 6557790U JP 6557790 U JP6557790 U JP 6557790U JP H0425229 U JPH0425229 U JP H0425229U
Authority
JP
Japan
Prior art keywords
plasma processing
processing apparatus
coaxial plasma
internal electrode
cylindrical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6557790U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6557790U priority Critical patent/JPH0425229U/ja
Publication of JPH0425229U publication Critical patent/JPH0425229U/ja
Pending legal-status Critical Current

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Landscapes

  • Drying Of Semiconductors (AREA)
JP6557790U 1990-06-21 1990-06-21 Pending JPH0425229U (en])

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6557790U JPH0425229U (en]) 1990-06-21 1990-06-21

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6557790U JPH0425229U (en]) 1990-06-21 1990-06-21

Publications (1)

Publication Number Publication Date
JPH0425229U true JPH0425229U (en]) 1992-02-28

Family

ID=31597530

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6557790U Pending JPH0425229U (en]) 1990-06-21 1990-06-21

Country Status (1)

Country Link
JP (1) JPH0425229U (en])

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5275985A (en) * 1975-12-22 1977-06-25 Tokyo Ouka Kougiyou Kk Apparatus for plasma treatment at low tempebature
JPS6075588A (ja) * 1983-09-30 1985-04-27 Hitachi Ltd 加熱機構付のスパツタエツチング装置
JPH0254929A (ja) * 1988-08-19 1990-02-23 Ramuko Kk プラズマ処理装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5275985A (en) * 1975-12-22 1977-06-25 Tokyo Ouka Kougiyou Kk Apparatus for plasma treatment at low tempebature
JPS6075588A (ja) * 1983-09-30 1985-04-27 Hitachi Ltd 加熱機構付のスパツタエツチング装置
JPH0254929A (ja) * 1988-08-19 1990-02-23 Ramuko Kk プラズマ処理装置

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